RF and Plasma

RF power is used in systems designed for semiconductor etching, film deposition, sputtering of hard media, spectroscopy and many other applications. These systems require extremely rugged power delivery systems with emphasis on performance accuracy and repeatablility.

We have designed high-efficiency RF power generators, impedance matches and system controls for some of the industry's most successful equipment manufacturer's. Let us design an RF power system for your company.

13.56 MHz, 27.12 MHz & 40.68 MHz Designs

Designs up to 10KW

Pulse Mode Operation

RF Combiners, Dividers and System Controls

Impedance Matching & Chamber Characterization

VCO's, Filters, Modulators and Related Circuits

Among our clients: ENI * Advanced Energy Industries * Trazar * Technics

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